Directed Self-Assembly of Block Copolymer, No1
نویسنده
چکیده
/Description The PS-rich and neutral PS-b-PMMA block copolymer (BCP) films were spin coated on the neutral random copolymer hydroxyl-terminated PS-r-PMMA layers grafted on the native oxide and 50 nm thick PECVD amorphous silicon oxide layers. Relationship between the grafting density of BCP and surface density of hydroxyl moiety on silicon oxide is discussed. Furthermore, optimization of annealing BCP films is reported, and wetted and de-wetted BCP films are shown in optical microscope images. In addition, finger print and nanopore structures of BCP films are also indicated in SEM images.
منابع مشابه
Rule-based Directed Self-assembly of Circuit-like Block copolymer Patterns
Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...
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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...
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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...
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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...
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